January 24, 2025
Photoresist Chemicals

1-Piperidinecarboxylic acid, 4-[2-oxo-2-[(phenylmethyl)amino]ethyl]-, 1,1-dimethylethyl ester

 

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2-Butenoic acid, 4-(4-chlorophenyl)-2-hydroxy-4-oxo-, (2Z)-, compd. with 2-pyridinamine (1:1)

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TIANFU-CHEM Butanedioic acid, tetradecenyl-, monomethyl ester

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