November 22, 2024
Photoresist Chemicals

1,2-Cyclobutanedicarboxylic acid, 3,4-bis[3-(methoxycarbonyl)phenyl]-, 1,2-dimethyl ester, (1R,2S,3R,4S)-rel-

 

You might also like

Dimer fatty acid, sebacic acid, ethylene diamine polymer

(1S,2S)-N,N’-Bis[3-oxo-2-(2,4,6-trimethylbenzoyl)butylidene]-1,2-diphenylethylenediaminato Cobalt(II)

Benzamide, N-butyl-2-(2-naphthalenyloxy)-5-nitro-

Inquiry