November 23, 2024
Photoresist Chemicals

1,3-Benzenedicarboxylic acid, 5-[methyl[(phenylmethyl)sulfonyl]amino]-, mono(phenylmethyl) ester

  • 849356-92-9
  • C23H21NO6S

You might also like

1H-Indazole-3-carbonitrile, 5-[5-(methoxymethyl)-4-methyl-3-pyridinyl]-1-(tetrahydro-2H-pyran-2-yl)-

2H-Indol-2-one, 1-(azidoacetyl)-1,3-dihydro-3,3-dimethyl-

TIANFUCHEM-2,1,3-Benzoxadiazol-4-ol, 1,4-dihydro-5,7-dinitro-, monopotassium salt

Inquiry