January 26, 2025
Photoresist Chemicals

1H-Pyrido[3,4-b]indole-3-carboxylic acid, 2,3,4,9-tetrahydro-2,4,4,9-tetramethyl-, (3R)-

 

You might also like

1,3-Cyclohexanedione, 5-(3-fluoro-2,4,5,6-tetramethylphenyl)-

TIANFU-CHEM Benzamide, N-[(1S)-2,3-dihydro-1H-inden-1-yl]-4-hydroxy-3-methyl-

488-20-0 Butanedioic acid, bis (methylene)-

Inquiry