January 27, 2025
Photoresist Chemicals

1H-Pyrrole-2-carboxylic acid, 4-cyano-3-[4-(3-cyano-2-thienyl)phenyl]-1-methyl-, ethyl ester

 

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Tetracosanoic acid, 3-[(trimethylsilyl)oxy]-, methyl ester, (3R)-

1,2-Ethanediamine, N,N,N’-trimethyl-N’-[6-phenyl-7-[4-[[4-[5-(2-pyridinyl)-1H-1,2,4-triazol-3- yl]-1-piperidinyl]methyl]phenyl]pyrido[2,3-d]pyrimidin-2-yl]-, trifluoroacetate

Benzeneacetic acid, 2-(2,6-diaminophenoxy)-

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