January 23, 2025
Photoresist Chemicals

2-Butenoic acid, 4-oxo-4-[(phenylmethyl)amino]-, 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl ester, (E)-

 

  • 91655-28-6
  • C21H14F17NO3

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