January 19, 2025
Photoresist Chemicals

3,5-Pyridinedicarboxylic acid, 1,4-dihydro-4-(2-methoxy-6-tetradecylphenyl)-2,6-dimethyl-, dimethyl ester

 

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1H-Indene-1-carboxylic acid, 6-[[(2R,6S)-4-(2,4-dichlorophenyl)-2,6-dimethyl-1-piperazinyl]sulfonyl]-2, 3-dihydro-, rel-

2-Naphthalenesulfonamide, N-[3,5-bis(4-methoxyphenyl)-4H-1,2,4-triazol-4-yl]-

Quinolinium, 1-(4-hydroxyphenyl)-2-[3-[1-(4-hydroxyphenyl)-2(1H)-quinolinylidene]-1- propenyl]-, iodide

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