Basic Info
Model No.: TF-2006
Additional Info
Packaging: As Buyer’s Request
Productivity: 100Ton
Brand: Tianfu
Transportation: Ocean,Land,Air,DHL，TNT
Place of Origin: China
Supply Ability: 50Ton
Certificate: ISO
Port: Shanghai port,Qingdao port
Product Description
P-acetoxystyrene can be used to synthesize polyparahydroxystyrene as a main component of a photoresist (photoresist). Poly-p-hydroxystyrene series of chemically amplified photoresists are currently the mainstream photoresist products in the world, and are one of the key technologies for processing photo-etching integrated circuits and manufacturing chips. The photo-etching technology is developed from the production of 0.3-0.28μm line width to the deep ultraviolet light (wavelength 248nm) to produce 0.18μm line width, and the ultra-deep ultraviolet light (wavelength 193nm) can be used to trace the line width to 0. 11 μm microcircuit. 248nm photoresist usually uses poly-p-hydroxystyrene derivative as film-forming resin, aryl iodonium salt or sulfonium salt as photoacid generator, using chemical amplification technology to release photoacid generator under light The acid, then acid catalyzes the cross-linking of the polymer (negative gelation) or the deprotection reaction (positive gelatinization), thereby greatly increasing the photosensitivity.
| Metal Contents | AI | ＜10ppb | ＜1 |
| Ca | ＜10ppb | 4.5 | |
| Mg | ＜10ppb | ＜1 | |
| Cu | ＜10ppb | ＜1 | |
| Fe | ＜10ppb | ＜1 | |
| Na | ＜10ppb | 9.2 | |
| Ni | ＜10ppb | ＜1 | |
| Zn | ＜10ppb | ＜1 | |
| K | ＜10ppb | ＜1 | |
| Mn | ＜10ppb | ＜1 | |
| Cr | ＜10ppb | ＜1 | |
| SN | ＜10ppb | 0.2 | |
| AS | ＜01ppb | 0.3 |
| Test Items | Specification | Results |
| Appearance | Colorless Liquid | Colorless Liquid |
| Purity (GC) | ≥99.0% (area) | 99.22% (area) |
| (w/w%) Water content by KF |
≤0.10% | 0.02% |
| Clarity (10%(w/w)Methanol Soivent) | Clear | Clear |
| Total Acid Number | ≤100(mgKOH/L) | 13.8(mgKOH/L) |
| Polymerization inhibitor | 200ppm-300ppm | 256 |
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Product Categories : Fine Chemical
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