January 22, 2025
Photoresist Chemicals

5-Heptenoic acid, 7-[3-hydroxy-2-[3-hydroxy-4-(pentyloxy)-1-pentenyl]-5-oxocyclopentyl]-

 

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4H-1,2,4-Triazole-3-methanol, 4-methyl-5-[1-(phenylmethyl)-1H-indazol-3-yl]-

9-Octadecen-1-one, 1-(4,5-diphenyl-2-oxazolyl)-, (9Z)-

Benzoic acid, 4-(benzoylamino)-, methyl ester

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