January 30, 2025
Photoresist Chemicals

3-Pyridinecarboxylic acid, 4-(cyclooctyloxy)-5-ethyl-1,2-dihydro-6-methyl-2-oxo-, ethyl ester

 

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Butanedioic acid, 2,3-bis[(4-methylbenzoyl)oxy]-, (2S,3S)-, compd. with (1S,2S,4R)-2-(5-iodo-3-pyridinyl)-7-azabicyclo[2.2.1]heptane (1:1)

[1,1′-Biphenyl]-4-ol, 2,6-bis(1,1-dimethylethyl)-2′,4′,6′-trimethyl-

5-Pyrimidinecarboxylic acid, 2-(methylthio)-4-[(phenylmethyl)thio]-6-[(4-pyridinylmethyl)amino]-, methyl ester

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