January 22, 2025
Photoresist Chemicals

Butanoic acid, 4-[[4-(2(3H)-benzoxazolylidenecyanomethyl)-2-pyrimidinyl]amino]-, methyl ester

 

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1H-Naphtho[2,3-c]pyran-5,10-dione, 3,4-dihydro-7-hydroxy-1,3-dimethyl-, (1R,3S)-

D-Alanine, N-[1-[(phenylmethoxy)carbonyl]-L-prolyl]-, compd. with N-cyclohexylcyclohexanamine (1:1)

1H-Isoindol-1-one, 2,3-dihydro-3-hydroxy-2-[(4-methylphenyl)sulfonyl]-3-(1-naphthalenyl)-

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