January 24, 2025
Photoresist Chemicals

1H-Indazole-3-carboxylic acid, 1-[(2,4-difluorophenyl)methyl]-6-(trifluoromethyl)-, hydrazide

 

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Cyclopentanone, 3,4-dimethyl-3-(1-oxopropyl)-, (3R,4S)-rel-

2-Selenazolamine, 4,5-dihydro-5-methyl-4-(4-methylpentyl)-, (4R,5S)-, (2E)-2-butenedioate (1:1)

2-Thiopheneacetonitrile, a-(4-amino-2-chlorophenyl)-

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