January 24, 2025
Photoresist Chemicals

Butanamide, N-[[4-methyl-6-[3-(trifluoromethyl)phenyl]-2-pyridinyl]methyl]-

  • 833456-50-1
  • C18H19F3N2O

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Benzoic acid, 4-(4,5-dihydro-3,5-diphenyl-1H-pyrazol-1-yl)-, 2-acetylphenyl ester

1-Naphthalenediazonium, 4-sulfo-, hydroxide, inner salt, reaction products with 4-methyl-1,3-benzenediamine and m-phenylenediamine, sodium salts

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