January 24, 2025
Photoresist Chemicals

Benzeneacetic acid, a-(cyclopentylmethyl)-3-fluoro-4-(methylsulfonyl)-

  • 588940-50-5
  • C15H19FO4S

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4H-Quinolizine-3-carboxylic acid, 7-[(3-chloro-2-fluorophenyl)methyl]-1-ethyl-4-oxo-, ethyl ester

1-Pyrrolidinecarboxylic acid, 2-(2-propen-1-yl)-5-(trimethylsilyl)-, methyl ester

1H-Imidazolium, 1-(1,1-dimethylethyl)-3-[(Z)-phenyl(phenylimino)methyl]-, chloride

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