January 25, 2025
Photoresist Chemicals

Butanoic acid, 2-[3-[[2-benzoxazolyl[3-(3,4-dimethylphenoxy)propyl]amino]methyl]phen oxy]-

  • 848260-03-7
  • C29H32N2O5

You might also like

[1,1′-Biphenyl]-4-carboxylic acid, 4′-phenoxy-

(5Z)-5-[(2-methoxyphenyl)methylidene]-3-(2-nitrophenyl)-2-sulfanylidene-imidazolidin-4-one

Linseed oil, phthalic anhydride, glycerin, tung oil, rosin, p-tert-butylphenol, formaldehyde polymer

Inquiry