November 23, 2024
Photoresist Chemicals

Butanoic acid, 4-[4-[(2S)-3-[(2-methoxyethyl)amino]-2-[[(methylthio)acetyl]amino]-3-oxo propyl]phenoxy]-

 

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Benzenamine, 2-(2-cyclopenten-1-yl)-5-(trifluoromethyl)-

5H-Pyrrolo[3,2-d]pyrimidin-4-amine, 6-(2-furanyl)-N-[3-methyl-4-[(6-methyl-3-pyridinyl)oxy]phenyl]-

Acetic acid, [[6-[5-phenyl-1-(phenylmethyl)-1H-pyrrol-2-yl]-2-naphthalenyl]oxy]-, methyl ester

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